| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering apparatus which continuously and stably grows dielectric films of the same composition while successively exchanging a plurality of substrates in sputtering the dielectric films containing a plurality of compositions. SOLUTION: According to one embodiment, the sputtering apparatus is provided with grounding counter electrodes disposed around a substrate holding section in a vacuum chamber, and the grounding counter electrodes has, in the surfaces of the counter electrodes facing the targets, a plurality of openings which extend toward the deep parts of the counter electrodes while inclining at an angle 10 to 70°with respect to the direction perpendicular to the target surface. COPYRIGHT: (C)2004,JPO
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