发明名称 METHOD AND SYSTEM FOR MAKING UNIFORM HIGH FREQUENCY PLASMA OVER LARGER AREA IN PLASMA-ACTIVATED CVD SYSTEM
摘要 <p>A system for making uniform the plasma generating conditions over a large area in a plasma-activated CVD system utilizing very high frequency (VHF). The system comprises first and second power supply sections disposed at the opposite end parts of a discharge electrode in the plasma-activated CVD system, wherein a cycle for supplying high frequency power of the same frequency and a cycle for supplying high frequency power of different frequency are conducted alternately at the first and second power supply sections such that the plasma generating conditions become uniform over a large area when viewed on time average due to plasma of different generating conditions in each cycle.</p>
申请公布号 WO2004040629(A1) 申请公布日期 2004.05.13
申请号 WO2002JP11208 申请日期 2002.10.29
申请人 MITSUBISHI HEAVY INDUSTRIES, LTD.;KAWAMURA, KEISUKE;TAKANO, AKEMI;MASHIMA, HIROSHI;TAKATUKA, HIROMU;YAMAUTI, YASUHIRO;TAKEUCHI, YOSHIAKI;SASAKAWA, EISHIRO 发明人 KAWAMURA, KEISUKE;TAKANO, AKEMI;MASHIMA, HIROSHI;TAKATUKA, HIROMU;YAMAUTI, YASUHIRO;TAKEUCHI, YOSHIAKI;SASAKAWA, EISHIRO
分类号 C23C16/509;H01J37/32;(IPC1-7):H01L21/205 主分类号 C23C16/509
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