| 摘要 |
PROBLEM TO BE SOLVED: To provide a producing method for a plurality of target materials with which the target materials can easily and stably be produced without lowering the productivity. SOLUTION: In the method for producing the target for sputtering, with which after filling up metallic powder into a metal-made capsule, this capsule is closed under vacuum state and successively, a hot isotropic pressurized sintering (HIP) treatment is applied to this capsule, after performing a second process, in which a first process for filling up a first metallic powder on the bottom part of the metal-made capsule and successively, a process arranging a separating plate on this metallic powder and filling up a second metallic powder on this separating plate, are repeated at least one time this capsule is sealed under vacuum and successively, the hot isotropic pressurized sintering (HIP) treatment is applied to this capsule. COPYRIGHT: (C)2004,JPO
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