发明名称 Verfahren zur Herstellung eines Siliziumkarbid-Einkristalls
摘要 Micropipe defects existing in a silicon carbide single crystal are closed within the single crystal. At least a portion of the micropipe defects opened on the surface of the silicon carbide single crystal (SiC substrate) is sealed up with a coating material. Then heat treatment is performed so as to saturate the inside of the micropipe defects with silicon carbide vapors. By this, the micropipe defects existing in the SiC substrate can be closed within the SiC substrate, not in a newly grown layer. Further, the micropipe defects can be efficiently closed by filling the micropipe defects with a silicon carbide material by preliminarily using super critical fluid and the like.
申请公布号 DE69916177(D1) 申请公布日期 2004.05.13
申请号 DE1999616177 申请日期 1999.05.26
申请人 DENSO CORP., KARIYA 发明人 OKAMOTO, ATSUTO;SUGIYAMA, NAOHIRO;TANI, TOSHIHIKO;KAMIYA, NOBUO;WAKAYAMA, HIROAKI;FUKUSHIMA, YOSHIAKI;HARA, KAZUKUNI;HIROSE, FUSAO;ONDA, SHOICHI;HARA, KUNIHIKO;ONODA, TAKASHI;KURIYAMA, HARUYOSHI;HASEGAWA, TAKESHI
分类号 C30B23/00;C30B33/00 主分类号 C30B23/00
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