| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide substrate processing equipment and a substrate processing system in which a substrate can be processed well by effectively preventing the mist generated in processing from adhering to the other major surface of the substrate. <P>SOLUTION: Since atmospheric gas is fed into a space SP formed between an atmosphere interrupting member 2 and a substrate S, the space SP has a positive pressure as compared with the circumference of the substrate (mist scattering atmosphere) and thereby intrusion of mist to the other major surface S2 side of the substrate SP is prevented effectively. Furthermore, the micro gap CL between the circumferential edge of the atmosphere interrupting member 2 and the substrate S is set in the range of 0.3mm-1mm. Consequently, mist can be prevented from leaking through the micro gap CL while stabilizing the attitude of the substrate S. When the interval is set in the range of 0.3mm-0.8mm, atmospheric gas supply into a micro space SP is suppressed and the attitude of the substrate is stabilized furthermore. Consequently, the substrate can be processed at a low running cost. <P>COPYRIGHT: (C)2004,JPO |
