| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a fine pattern by which an original reflectance reducing effect can be obtained even if a resist film is subjected to ashing and resist coating is performed again. <P>SOLUTION: A first antireflection film which suppresses reflection in an absorption mode is formed on the surface of a substrate. A second antireflection film which suppresses reflection in a reduction interference mode is formed on the first antireflection film. A cap film is formed on the second antireflection film. A photosensitive resist film is formed on the cap film. The photosensitive resist film is exposed to light with first wavelengths for forming a latent image. The exposed resist film is developed. <P>COPYRIGHT: (C)2004,JPO |
