| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a 2-alkyl-2-adamantyl (meth)acrylate, by which the 2-alkyl-2-adamantyl (meth)acrylate useful as a resist material for semiconductors, or the like, is obtained in high recovery ratio and in high purity without requiring a complicated operation such as strict temperature control. SOLUTION: This method for producing the 2-alkyl-2-adamantyl (meth)acrylate is characterized by recrystallizing the 2-alkyl-2-adamantyl (meth)acrylate in a mixed solvent comprising a solvent having a dielectric constant of 5.0 to 25.0 at 25°C, such as isopropyl alcohol or tetrahydrofuran, and a solvent having a dielectric constant of 30.0 to 40.0 at 25°C, such as methanol or acetonitrile, in a weight ratio of 3:97 to 35:65. COPYRIGHT: (C)2004,JPO
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