| 摘要 |
PROBLEM TO BE SOLVED: To provide an ultrasonic cleaning apparatus by which objects to be cleaned such as a silicon wafer of a semiconductor requiring high cleanliness and a dust-collected filter can be cleaned uniformly in high efficiency and which has no possibility that the stain removed from the object to be cleaned is stuck again to the object to be cleaned. SOLUTION: This ultrasonic cleaning apparatus is constituted so that many objects 14 to be cleaned are cleaned by immersing the objects 14 in a cleaning liquid and irradiating the immersed objects 14 with the ultrasonic wave emitted from an ultrasonic vibrator 16. The objects 14 are placed on an X-Y coordinate plane in a cleaning tank 10. The vibrator 16 is moved on the X-Y coordinate plane above the objects 14 by the prescribed pattern. The cleaning liquid to be supplied to the tank 10 is made to always pass through the tank 10 so that the objects 14 can be cleaned in the pure cleaning liquid. COPYRIGHT: (C)2004,JPO
|
