METHOD AND DEVICE FOR MOUNTING VACUUM OF MICRO ELECTRO MECHANICAL SYSTEM AT WAFER LEVEL

摘要

PURPOSE: A method and device for mounting vacuum of MEMS(micro electro mechanical system) at wafer level are provided to be capable of exactly controlling the degree of vacuum to an aiming extent and conserving initial vacuum degree in spite of the elapse of time. CONSTITUTION: A getter is attached to a cavity, wherein the cavity is formed at a cover(S310). The cover is aligned with a semiconductor substrate, wherein the semiconductor substrate is loaded in a vacuum chamber(S320). Inert gas is flowed into the vacuum chamber according to the set degree of vacuum(S330). The cover is attached to the semiconductor substrate(S340). Preferably, the getter is made of titanium. Preferably, the attaching process between the cover and the semiconductor substrate is performed, after predetermined time is passed from the inert gas inflow process.