| 摘要 |
PURPOSE: A gate valve apparatus used for a semiconductor device manufacturing equipment is provided to be capable of easily controlling the inner pressure of a process chamber. CONSTITUTION: A gate valve apparatus used for a semiconductor device manufacturing equipment includes a body part(136). At this time, the body part includes an upper body(132), a lower body(133), and a path(137) formed at its inner portion. The gate valve apparatus further includes a blade(134) between the upper and lower body for controlling the size of the path, and a driving part(135) for moving the blade. At this time, the path is linearly switched according to the moving extent of the blade. Preferably, the cross-section of the path is a rectangular shape. Preferably, the blade is like a rectangular plate structure.
|
