发明名称 EPITAXIAL WAFER FOR SEMICONDUCTOR LIGHT-EMITTING ELEMENT, AND THE SEMICONDUCTOR LIGHT-EMITTING ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide an epitaxial wafer for semiconductor light-emitting elements, and semiconductor light-emitting elements which are LEDs that do not break, even if voltage changes occur to a certain extent, i.e., are highly reliable, and can be so manufactured at a low cost as to have a high output. <P>SOLUTION: In the semiconductor light-emitting element or its epitaxial wafer, there are laminated successively on a first conduction type semiconductor substrate 1 a first conductivity-type clad layer 3, an undoped active layer 4, a second conductivity-type clad layer 5, and further, a second conductivity-type current dispersion layer 6. Moreover, undoped resistance layers 6b and second conductivity-type layers 6a are formed alternately in the second conductivity-type current dispersion layer 6, and the at least two or more undoped resistance layers 6b are also formed. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004140300(A) 申请公布日期 2004.05.13
申请号 JP20020305933 申请日期 2002.10.21
申请人 HITACHI CABLE LTD 发明人 KONNO TAIICHIRO;ARAI MASAHIRO
分类号 H01L21/205;H01L33/30 主分类号 H01L21/205
代理机构 代理人
主权项
地址