| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam exposure device which exposes a wafer while correcting the deflection amount of an electron beam according to thermal deformation of the wafer. SOLUTION: The electron beam exposure device exposes the wafer to a pattern with the electron beam. The device is equipped with an electron beam generation part which generates the electron beam, a deflection part which deflects the electron beam to irradiate a desired position on the wafer with the electron beam, a chamber which holds the wafer in pressure-reduced space, and a deflection control unit which controls the deflection amount of the deflection part according to the elapsed time from when the wafer is carried in the chamber. COPYRIGHT: (C)2004,JPO
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