发明名称 |
Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby |
摘要 |
A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.
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申请公布号 |
US2004089819(A1) |
申请公布日期 |
2004.05.13 |
申请号 |
US20030700445 |
申请日期 |
2003.11.05 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KOSHELEV KONSTANTIN NIKOLAEVITCH;BIJKERK FREDERIK;ZUKAVISHVILI GIVI GEORGIEVITCH;KOROP EVGENII DMITREEVITCH;IVANOV VLADIMIR VITAL?APOS,EVITCH |
分类号 |
G21K5/02;G03F7/20;H01L21/027;H05G2/00;H05H1/24;(IPC1-7):G03B42/00 |
主分类号 |
G21K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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