发明名称 Method for fabricating a through-hole interconnection substrate and a through-hole interconnection substrate
摘要 A blind hole (3) is formed on a substrate (1) from a first side of the substrate toward a second side of the substrate (1). A conductor (11) is filled in the blind hole (3). The substrate (1) is removed from the opposite side to expose the conductor (13) filled in the blind hole (3).
申请公布号 US2004092117(A1) 申请公布日期 2004.05.13
申请号 US20030701635 申请日期 2003.11.06
申请人 FUJIKURA LTD. 发明人 SUEMASU TATSUO;TAKIZAWA TAKASHI
分类号 H01L23/14;H01L21/288;H01L21/3063;H01L21/48;H01L21/768;H01L23/48;H01L25/065;(IPC1-7):H01L21/311 主分类号 H01L23/14
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