| 摘要 |
A rinsing lid for a wet bench cleaning chamber used in the rinsing of acids, chemicals and/or particles from semiconductor wafers. The rinsing lid includes a lid housing having an upper water reservoir for receiving a stream of deionized water or other cleaning liquid. A water distribution plate is provided in the lid housing beneath the water reservoir. Small water openings extend through the water distribution plate at the water inlet end, and large water openings extend through the water distribution plate at the opposite end, of the lid housing. A nozzle plate provides multiple nozzle openings in the lid housing beneath the water distribution plate. The large water openings at the end of the lid housing opposite the water inlet end compensate for diminishing water pressure along the length of the lid housing, providing water sprays of uniform force and volume.
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