| 摘要 |
PROBLEM TO BE SOLVED: To suppress the size increase of an exposure system without lowering the exposure accuracy of the system. SOLUTION: The exposure system is provided with counter masses 42A and 42B which are moved in accordance with a momentum conservation law by the action of a reaction generated when a wafer stage WST is driven by means of a driving system, trimming motors 106A and 106B which respectively drive the masses 42A and 42B, and a controller which controls the motors 106A and 106B according to the driven state of the stage WST by means of the driving system so as to offset at least part of the movement of the masses 42A and 42B in accordance with the momentum conservation law. In this case, the controller can offset the partial or whole movement of the masses 42A and 42B in accordance with the momentum conservation law by controlling the motors 106A and 106B according to the driven state of the stage WST by means of the driving system within an extent in which no influence is exerted upon exposure. COPYRIGHT: (C)2004,JPO |
