发明名称 SUBSTRATE TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To control a supply quantity of a treatment liquid accurately by a simple operation. SOLUTION: A nozzle for supplying a developer to a substrate held on a substrate mounting table is connected by a treatment liquid supply pipe connected to a developer tank. The treatment liquid supply pipe is equipped with a flow rate regulating valve 9. The flow rate regulating valve 9 is such that a valve body 11 for regulating the opening of a supply flow channel is equipped in a valve box 10 wherein the developer supply flow channel is formed. A hollow valve rod 12 having a square cross-sectional shape is integrally connected to the valve body 11, a nut 13 is connected at the tip of the valve rod 12, and the nut 13 is screwed on a screw shaft 15 which is rotated by an electric motor (stepping motor) 14. The valve body 11 is opened or closed by the bi-directional operation of the electric motor 14. By optionally regulating the opening and an opening/closing speed of the valve body 11, the supply quantity of the treatment liquid is controlled. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004140168(A) 申请公布日期 2004.05.13
申请号 JP20020303076 申请日期 2002.10.17
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MIHASHI TAKESHI
分类号 G03F7/30;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/30
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