发明名称 Organic film formation apparatus
摘要 The organic raw material is vaporized to generate the raw material gas in the vaporizing chamber. This raw material gas is mixed with the carrier gas, and transported to the chamber through the raw material gas transportation pipe. The substrate is held within the chamber while the organic film formation surface of the substrate does not face downward in a vertical direction straight up from the ground. The injector of the raw material gas is opposed to the substrate. The raw material gas is blasted from the direction orthogonal to the substrate. Particles fall without adhering to the substrate when holding the substrate in the vertical direction. The deformation of the substrate and the mask for separately painting pixels can be suppressed.
申请公布号 US2004089232(A1) 申请公布日期 2004.05.13
申请号 US20030622340 申请日期 2003.07.18
申请人 SASAKI KOJI;NARUI HIRONOBU;YANASHIMA KATSUNORI;TANAKA SADAO;MEMEZAWA AKIHIKO 发明人 SASAKI KOJI;NARUI HIRONOBU;YANASHIMA KATSUNORI;TANAKA SADAO;MEMEZAWA AKIHIKO
分类号 H05B33/10;C23C14/04;C23C14/12;C23C14/24;H01L51/40;H01L51/50;H01L51/56;(IPC1-7):B05B1/28;B05B15/04;B05C9/08 主分类号 H05B33/10
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