| 摘要 |
PURPOSE: A wafer maintenance method and system of a photo spinner are provided to be capable of restraining the bridge or CD(Critical Dimension) failure of a photoresist layer coated on a wafer due to equipment reactivation. CONSTITUTION: Equipment is stopped according to the generation of alarm while a photoresist coating process is performed on a wafer(21,23). The equipment is reactivated when completing the steps according to the alarm(25,27). The stand-by time of the wafer in the equipment is calculated and stored(29). Whether the stand-by time exceeds a maximum stand-by time is decided(31). When the stand-by time exceeds the maximum stand-by time, stand-by alarm is generated(33). The wafer corresponding to the stand-by alarm is separated from the equipment and a re-treatment is performed on the wafer(35,37).
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