发明名称 CHEMICAL TREATING METHOD AND CHEMICAL TREATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To simply perform etching to a film-formed chromium on a material to be film-formed. SOLUTION: A chemical treating method is the one, with which the chromium film under state of forming the film on the material to be film-formed is etched as a prescribed pattern. The method comprizes a cathode electrolytic reduction process, in which the chromium film is electrolytically reduced with treating liquid containing chloride ion by using the chromium film as the cathode, and an acid dipping process, in which after applying the above cathode electrolytic reduction process, the chromium film is dipped into an acidic treating liquid. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004137594(A) 申请公布日期 2004.05.13
申请号 JP20030207854 申请日期 2003.08.19
申请人 CASIO MICRONICS CO LTD;MURATA:KK 发明人 YAMAMOTO MICHIHIKO;YONEMURA MASAO;SAWAGATA YUKA;MAEHARA TOMOKO
分类号 C25F3/08;C23F1/00;C23F1/26;C25F3/02;C25F7/00;H01L21/60;(IPC1-7):C25F3/08 主分类号 C25F3/08
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