| 摘要 |
An illumination optical apparatus (14-40) and exposure apparatus (10) provided with the illumination apparatus, capable of employing a high-output light source. The illumination apparatus comprises, in order along an optical axis, a light source (14) capable of providing a primary light beam (B) having a cross-section, a condenser optical system (30) to condense the primary light beam so as to form a convergence point (F) adjacent the condenser optical system, a light-pipe optical integrator (160) having a rectangular cross-sectional shape with a first side of length dx, a second side of length dy, and a most light-source-wise incident surface (160a) axially spaced from the convergence point by a spacing (L2). The integrator is capable of forming a plurality of secondary light sources and corresponding secondary light beams (B') from the primary light beam. Adjacent the integrator is an imaging optical system (40) to converge the primary and secondary light beams to illuminate the illumination surface. The apparatus preferably satisfies the following conditions: 0.1<=L2<=DX/(2xtan alphax) 0.1<=L2<=DY/(2xtan alphay), wherein alphax is the divergence angle of the primary light beam when incident the integrator incident surface, as measured in a first plane that includes the optical axis. Likewise, alphay is the corresponding angle as measured in a second plane orthogonal to the first plane. These conditions ensure that the integrator will not be damaged or otherwise broken by high concentrations of light on the integrator incident surface. The exposure apparatus comprises the above-described illumination optical system and further includes a projection optical system (54) arranged adjacent the illumination surface so as to project an image of a pattern on a mask (48) onto a photosensitive substrate (60), thereby patterning the substrate.
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