发明名称 |
ELECTRON BEAM EXPOSURE METHOD AND ELECTRON BEAM EXPOSURE SYSTEM |
摘要 |
In an electron beam exposure method in which an article subjected to exposure and an electron beam irradiation spot are moved relative to each other at a continuous speed, the article is exposed at a plurality of irradiation intensities of an electron beam by changing a transmittance of an electron optical system for forming the electron beam irradiation spot on the article. <IMAGE> |
申请公布号 |
AU2003275640(A1) |
申请公布日期 |
2004.05.13 |
申请号 |
AU20030275640 |
申请日期 |
2003.10.24 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
EIICHI ITO;MASAHIKO TSUKUDA |
分类号 |
G03F7/20;G11B7/26;G21K5/04;G21K5/10;H01J37/317 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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