发明名称 |
PROTECTIVE FILM LAMINATED FINE STRUCTURE, AND DRYING METHOD FOR FINE STRUCTURE USING THE PROTECTIVE FILM LAMINATED FINE STRUCTURE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent a pattern from being destroyed by preventing the surface of a fine structure of a substrate or the like from being naturally dried in the atmosphere, when the fine structure of the semiconductor substrate is dried after it is developed with a liquefied or supercritical fluid. <P>SOLUTION: The protective film laminated fine structure is adapted in a process using a liquefied or supercritical fluid before it is dried in a high pressure container, a protective film comprising a highly viscous substance is formed on the surface of the fine structure. <P>COPYRIGHT: (C)2004,JPO</p> |
申请公布号 |
JP2004140321(A) |
申请公布日期 |
2004.05.13 |
申请号 |
JP20030134359 |
申请日期 |
2003.05.13 |
申请人 |
KOBE STEEL LTD |
发明人 |
KAWAKAMI NOBUYUKI;KUGIMIYA TOSHIHIRO;KOHORI TAKASHI |
分类号 |
C23C26/00;B29C71/00;B32B27/00;B81C1/00;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
C23C26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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