发明名称 X-RAY MICROINSPECTION APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an X-ray microinspection apparatus that extremely quickly achieves non-destructive examination with an ultrahigh resolution and has superior functions, such as a precise electronic probe control function, a CT function, an element analysis function, and a target change function. <P>SOLUTION: The X-ray microinspection apparatus comprises a magnetic field superimposition lens, where a magnetic field generation section is arranged near an electron generation section; a reflection electron detection means that is arranged near a target for X-ray generation and detects a reflection electron from the target for X-ray generation of an electron probe formed via the magnetic field superimposition lens; and an electron image creation means for imaging an electronic image on the surface of the target for X-ray generation, based on the detection signal of the reflection electron detection means. The X-ray microinspection apparatus can perform focus adjustment to the target for X-ray generation of the electronic probe and adjustment including astigmatism correction, based on the image information of the electronic image. Additionally, the X-ray microinspection apparatus mounts the electronic probe control function, an electronic beam axis alignment function, the CT function, the element analysis function, the target change function, and the like. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004138461(A) 申请公布日期 2004.05.13
申请号 JP20020302537 申请日期 2002.10.17
申请人 TOHKEN CO LTD 发明人 YADA KEIJI;KAI HIROMI;SAITO YASUSHI
分类号 G01N23/04;G01N23/223;G01N23/225;G21K1/00;G21K1/093;G21K5/04;G21K7/00;H01J37/147;H01J37/153;H01J37/21;H01J37/244;(IPC1-7):G01N23/04 主分类号 G01N23/04
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