发明名称 X-RAY MICROINSPECTION APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an X-ray microinspection apparatus that extremely quickly enables non-destructive inspection with a high resolution of 0.1μm or less and is capable of greatly contributing to the field of nanotechnology. <P>SOLUTION: In the X-ray microinspectioon apparatus that has an X-ray generation means for generating X rays by irradiating a target for X-ray generation with electron beams from an electron source and utilizes the X rays to inspect an object to be inspected, a magnetic field superimposition lens, where a magnetic field generation section is arranged near the electron generation section of an electron gun, is provided as the component of the X-ray generation means. Additionally, a liquid metal electron source using a liquid metal as the electron source or a heat field emission electron source is provided as the component of the X-ray generation means. Further, a target with a heat sink using a CVD diamond as the heat sink as the target for X-ray generation is provided as the component of the X-ray generation means. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004138460(A) 申请公布日期 2004.05.13
申请号 JP20020302534 申请日期 2002.10.17
申请人 TOHKEN CO LTD 发明人 YADA KEIJI;KAI HIROMI;SAITO YASUSHI
分类号 G01N23/04;G01N23/223;G01N23/225;G21K1/00;G21K1/093;G21K5/08;H01J37/073;(IPC1-7):G01N23/04 主分类号 G01N23/04
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