发明名称 CLEANING APPARATUS OF CONTAMINATED GAS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a cleaning apparatus of contaminated gas allowing the cleaning effect to continue for a long term. <P>SOLUTION: The cleaning apparatus 40 of contaminated gas 10 which cleans the contaminated gas 10 is composed of a nitrogen oxide removing layer 20 which is made of soil and removes nitrogen oxide 11 included in the contaminated gas 10, a sulfur oxide removing layer 30 which removes sulfur oxide 12 included in the contaminated gas 10 and a water feeding means 50 which supplies water 51 to the respective layers 20, 30. Therein, the contaminated gas 10 is let to pass through the nitrogen oxide removing layer 20 and the sulfur oxide removing layer 30 to which the water 51 is supplied and the nitrogen oxide 11 and the sulfur oxide 12 which are absorbed in the water 51 are decomposed and removed. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004136235(A) 申请公布日期 2004.05.13
申请号 JP20020304949 申请日期 2002.10.18
申请人 TAISEI CORP 发明人 SOEJIMA TAKAMICHI;ITO MASAKO;HOAKI TOSHIHIRO;IMAMURA SATOSHI
分类号 B01D53/56;B01D53/34;B01D53/50;B01D53/77;C08L101/16;(IPC1-7):B01D53/56 主分类号 B01D53/56
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