发明名称 |
ISOPROPYL ALCOHOL SUPPLY METHOD AND APPARATUS |
摘要 |
PURPOSE: An isopropyl alcohol supply method and its apparatus are provided to be capable of quickly increasing the concentration of isopropyl alcohol in a drying container for drying a wafer. CONSTITUTION: Isopropyl alcohol is stored in a vapor generating container(S100). Isopropyl alcohol vapor is generated by heating the vapor generating container(S200). The inner portion of the vapor generating container is pressurized by supplying nitrogen gas into the vapor generating container(S300). Drying gas mixed with the isopropyl alcohol vapor and the nitrogen gas is supplied into a drying container(S400). Preferably, the inner pressure of the pressurized vapor generating container is in the range of 1.5-2.5 Kg/cm2. Preferably, the temperature of the drying gas is in the range of 130-180 °C.
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申请公布号 |
KR20040040755(A) |
申请公布日期 |
2004.05.13 |
申请号 |
KR20020068983 |
申请日期 |
2002.11.08 |
申请人 |
K.C. TECH CO., LTD. |
发明人 |
JANG, SEONG GI;KWON, YEONG GYU;LEE, UI GANG;PARK, YEONG CHUN |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
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