发明名称 ISOPROPYL ALCOHOL SUPPLY METHOD AND APPARATUS
摘要 PURPOSE: An isopropyl alcohol supply method and its apparatus are provided to be capable of quickly increasing the concentration of isopropyl alcohol in a drying container for drying a wafer. CONSTITUTION: Isopropyl alcohol is stored in a vapor generating container(S100). Isopropyl alcohol vapor is generated by heating the vapor generating container(S200). The inner portion of the vapor generating container is pressurized by supplying nitrogen gas into the vapor generating container(S300). Drying gas mixed with the isopropyl alcohol vapor and the nitrogen gas is supplied into a drying container(S400). Preferably, the inner pressure of the pressurized vapor generating container is in the range of 1.5-2.5 Kg/cm2. Preferably, the temperature of the drying gas is in the range of 130-180 °C.
申请公布号 KR20040040755(A) 申请公布日期 2004.05.13
申请号 KR20020068983 申请日期 2002.11.08
申请人 K.C. TECH CO., LTD. 发明人 JANG, SEONG GI;KWON, YEONG GYU;LEE, UI GANG;PARK, YEONG CHUN
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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