| 摘要 |
PURPOSE: A method for forming an insulating layer is provided to compensate the adhesive force between a lower thin film and a flowable oxide layer by performing a surface treatment on the lower thin film. CONSTITUTION: A surface treatment is performed on a substrate(10). At this time, the substrate has a plurality of metal lines(12). Flowable oxide is then supplied to the entire surface of the resultant structure for forming a flowable oxide layer(14). Preferably, an oxidation process or nitridation process is used as the surface treatment. Preferably, the oxidation process is one selected from a group consisting of an oxygen plasma process, an oxygen hard bake process, or a cleaning process. Preferably, the nitridation process is one selected from a group consisting of an ammonia plasma process, a nitrogen hard bake process, or a cleaning process.
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