发明名称 |
APPARATUS AND METHOD FOR CLEANING SURFACES OF SEMICONDUCTOR WAFERS USING OZONE |
摘要 |
An apparatus and method for cleaning surfaces of semiconductor wafers utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of cleaning fluid formed on a semiconductor wafer surface to increase the amount of gaseous material that reaches the wafer surface through the boundary layer. |
申请公布号 |
WO2004040370(A2) |
申请公布日期 |
2004.05.13 |
申请号 |
WO2003US34376 |
申请日期 |
2003.10.29 |
申请人 |
NOVO RESEARCH INC. |
发明人 |
YONG, BAE, KIM;IN KWON, JEONG;JUNGYUP, KIM |
分类号 |
B08B3/00;B08B3/02;B08B7/04 |
主分类号 |
B08B3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|