发明名称 Shearing interferometry system for measurement of a wave front for use in measuring an optical imaging system in order to quantify its quality, said system having filters to suppress unwanted higher diffraction orders
摘要 <p>Device for measuring an optical imaging system by wave front measurement using shearing interferometry comprises: an illumination component on the object side prior to the imaging system (1); a diffraction grating (3) arranged in front of the image plane; a filter mask (4) in the image plane and a detector unit (5) arranged after the detector. The illumination component has a coherence mask (2) with a multiple opening mask structure that is used to suppress undesirable diffraction orders. Alternately or additionally the filter mask in the image plane can be moved.</p>
申请公布号 DE10260985(A1) 申请公布日期 2004.05.13
申请号 DE2002160985 申请日期 2002.12.18
申请人 CARL ZEISS SMT AG 发明人 HAIDNER, HELMUT;HOCH, RAINER;DOERING, GORDON
分类号 G01J9/02;G01M11/02;G02B27/44;G03F7/20;(IPC1-7):G01J9/04;G02B27/42;G01B9/02 主分类号 G01J9/02
代理机构 代理人
主权项
地址