| 摘要 |
PURPOSE: A process and a composition for removing residues from a microstructure of object are provided to reduce a structure defect in a material. CONSTITUTION: A composition for removing residues from a microstructure of an object includes carbon dioxide, an additive for removing the residues, inhibitor for suppressing residues, and a co-solvent for dissolving the additive and the inhibitor in the carbon dioxide at a pressurized fluid condition. The additive includes a quaternary-ammoniumfluoride. The quaternary-ammoniumfluoride is selected from the group including tetramethylammonium fluoride, tetraethylammonium fluoride, tetrapropylammonium fluoride, tetrabutylammonium fluoride, choline fluoride, and mixtures thereof. The quaternary-ammoniumfluoride is tetramethylammonium fluoride. The additive further includes a quaternary ammoniumhydroxide. |
