POLISHING PAD HAVING IMPROVED POLISHING CHARACTERISTICS

摘要

PURPOSE: A polishing pad is provided to prevent holes from being blocked by dressings in order to improve a polishing characteristic. CONSTITUTION: A polishing pad includes a water-insoluble matrix material and water-soluble particles. The water-insoluble matrix material includes a crosslinked polymer. The water-soluble particles are dispersed in the water-insoluble matrix material. The solubility of the water-soluble particles in water is 0.1 to 10 wt% at 25 deg.C. The amount of water-soluble particles from the pad when the pad is immersed in water is 0.05 to 50 wt% at 25 deg.C. The solubility of the water-soluble particles in water is 0.5 to 15 wt% at 50 deg.C, and the amount of water-soluble particles eluted from the pad when the pad is immersed in water is 0.05 to 50 wt% at 50 deg.C. The solubility of the water-soluble particles in water is 0.1 to 3 wt% at 25 deg.C at a pH of 3 to 11.