LOADLOCK CHAMBER HAVING CORROSION-PREVENTING LAYER

摘要

PURPOSE: A loadlock chamber having a corrosion-preventing layer is provided to prolong the lifetime of the loadlock chamber and prevent the wafer transiently stored in the chamber from being contaminated. CONSTITUTION: A loadlock chamber of semiconductor etching equipment includes a corrosion preventing layer coated on its inner wall and the surface of a stage. Preferably, the corrosion preventing layer is made of one selected from a group consisting of Al2O3, AlC, TiN, and AIN. Preferably, the corrosion preventing layer has a thickness of 30-600 μm. Preferably, the corrosion preventing layer is completed by sequentially coating an phosphor nickel layer(31) and a ceramic layer(32) on the surface(21) of the chamber.