发明名称 RECORDING MEDIUM EXCELLENT IN LIGHT-RESISTANCE AND METHOD FOR PRODUCTION THEREOF
摘要 An ink jet recording medium comprising a support and, on the support, at least one layer comprising cationic organic particles which have a glass transition temperature of from 70 to 130 DEG C and comprise (A) 0.1 to 10 % by weight of a monomer having a hindered amine type functional group, (B) 0.1 to 10 % by weight of a monomer having a benzotriazole type functional group and (C) 80 to 99.8 % by weight of a monomer selected from styrene and acrylic monomers. <??>A process for producing an ink jet recording medium which process comprises applying a suspension of copolymeric particles which have a glass transition temperature of from 70 to 130 DEG C and comprise (A) 0.1 to 10 % by weight of a monomer having a hindered amine type functional group, (B) 0.1 to 10 % by weight of a monomer having a benzotriazole type functional group and (C) 80 to 99.8 % by weight of a monomer selected from styrene and acrylic monomers, on a support, and allowing the coating surface in a wet state or in a dried state to pressure contact with a mirror roll to smooth the surface. <??>The present invention can provide the ink jet recording sheet having excellent ink absorption characteristics, color development concentration, water resistance, light resistance, yellowing resistance and surface strength, and the process for producing the recording sheet.
申请公布号 EP1418056(A1) 申请公布日期 2004.05.12
申请号 EP20020751634 申请日期 2002.07.18
申请人 MITSUI CHEMICALS, INC.;SEIKO EPSON CORPORATION 发明人 ISHIDA, TADASHI;KUSUMOTO, MASAYA;TOMITA, YOSHIHIKO;ITO, SOTA;ONISHI, HIROYUKI;HANMURA, MASAHIRO
分类号 B41M5/00;B41M5/52;(IPC1-7):B41M5/00 主分类号 B41M5/00
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