发明名称 Solder ball attaching process
摘要 A solder ball attaching process for attaching solder balls to a wafer is provided. First, an under-ball-metallurgy layer is formed on the active surface of the wafer. Patterned masking layers are sequentially formed over the active surface of the wafer. The masking layers together form a step opening structure that exposes the under-ball-metallic layer. A solder ball is placed on the uppermost masking layer and allowed to roll so that the solder ball drops into the step opening structure by gravity. A reflow process is conducted to join the solder ball and the under-ball-metallurgy layer together. Finally, various masking layers are removed to expose the solder ball on the bonding pad of the wafer.
申请公布号 US6732912(B2) 申请公布日期 2004.05.11
申请号 US20020248225 申请日期 2002.12.30
申请人 ADVANCED SEMICONDUCTOR ENGINEERING, INC. 发明人 TONG HO-MING;LEE CHUN-CHI;FANG JEN-KUANG;HUANG MIN-LUNG;CHEN JAU-SHOUNG;SU CHING-HUEI;WENG CHAO-FU;LEE YUNG-CHI;CHOU YU-CHEN;WU TSUNG-HUA;TAO SU
分类号 B23K3/06;H01L21/60;H01L23/485;H05K3/34;(IPC1-7):B23K31/02 主分类号 B23K3/06
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