发明名称 Pressure controlled heat source and method for using such for RTP
摘要 A thermal device with a container having a surface exposed to the substrate, wherein the container further has a heat source and a plurality of thermal shields situated between the surface exposed to the substrate and the heat source. The thermal shields are spaced from one another by a predetermined distance defining one or more gaps therebetween, wherein the predetermined distance is associated with a mean free path of a gas residing therein. Alternatively, the predetermined distance is variable. A pressure of a gas residing within the one or more gaps is controlled, wherein the pressure of the gas switches the thermal conductivity of the gas between generally conductive and generally non-conductive.
申请公布号 US6735378(B1) 申请公布日期 2004.05.11
申请号 US20030448156 申请日期 2003.05.29
申请人 AXCELIS TECHNOLOGIES, INC. 发明人 KELLERMAN PETER L.;CARLSON FREDERICK M.
分类号 H01L21/00;(IPC1-7):F26B19/00 主分类号 H01L21/00
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