发明名称 |
High power gas discharge laser with line narrowing unit |
摘要 |
A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of hot gas layers present on the face of the grating.In preferred embodiments a stream of gas is directed across the face of the grating. In other embodiments the effect of the hot gas layer is reduced with the use of helium as a purge gas and in other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
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申请公布号 |
US6735236(B2) |
申请公布日期 |
2004.05.11 |
申请号 |
US19990451407 |
申请日期 |
1999.11.30 |
申请人 |
CYMER, INC. |
发明人 |
CYBULSKI RAYMOND F.;ERSHOV ALEXANDER I.;ONKELS ECKEHARD D.;DAS PALASH P.;RICHARDSON DANILO K.;BUCK JESSE D. |
分类号 |
H01S3/225;G03F7/20;H01S3/03;H01S3/034;H01S3/036;H01S3/04;H01S3/08;H01S3/081;H01S3/086;H01S3/13;H01S3/134;H01S3/137;H01S3/139;(IPC1-7):H01S3/08;H01S3/10 |
主分类号 |
H01S3/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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