发明名称 Method of forming crystalline silicon film
摘要 To provide a method of promoting quality of crystals and increasing growth rate in a process of carrying out crystal growth in a horizontal direction of an amorphous silicon film by using a catalyst element expediting crystallization, in respect of the amorphous silicon film for carrying out horizontal growth by using a catalyst element of nickel or the like, irregularities of a matrix (underlayer film or substrate) in contact with the amorphous silicon film are made smaller than the film thickness of the amorphous silicon film by which crystal growth occurs substantially entirely by the catalyst element and interruption of growth caused by natural crystallization or the irregularities of a matrix can be prevented.
申请公布号 US6733584(B1) 申请公布日期 2004.05.11
申请号 US19970995368 申请日期 1997.12.22
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 OHTANI HISASHI
分类号 H01L21/20;H01L21/336;H01L21/77;H01L21/84;H01L29/786;(IPC1-7):C30B1/06 主分类号 H01L21/20
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