发明名称 |
Materials and methods for the purification of hydride gases |
摘要 |
Regenerable gas purifier materials are provided capable of reducing the level of contaminants such as oxygen and moisture in a hydride gas stream to parts-per-billion levels or sub-parts-per-billion levels. The purifier materials of this invention comprise a thin layer of one or more reduced forms of a metal oxide coated on the surface of a nonreactive substrate. The thin layer may further contain the completely reduced form of the metal. In one embodiment, the total surface area of the thin layer is less than 100 m<2>/g. |
申请公布号 |
US6733734(B2) |
申请公布日期 |
2004.05.11 |
申请号 |
US20010003179 |
申请日期 |
2001.10.31 |
申请人 |
MATHESON TRI-GAS |
发明人 |
WATANABE TADAHARU;FRAENKEL DAN |
分类号 |
B01D53/02;B01J20/06;B01J20/32;C01B6/34;(IPC1-7):B01J8/00 |
主分类号 |
B01D53/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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