CHEMICALLY AMPLIFIED POLYMER HAVING CYCLODODECYL-COMBINED PENDANT GROUP, PREPARATION METHOD THEREOF AND RESIST COMPOSITION CONTAINING THE POLYMER

摘要

PURPOSE: A 1-alkyl-1-cyclododecyl (meth)acrylate, a 1-alkyl-1-cyclododecyl-4-norbornene-1-carboxylate, photosensitive copolymer and terpolymer prepared from the monomers, their preparation methods, a chemically amplified ArF positive photoresist composition and a semiconductor device prepared by using the composition are provided, to improve a resolution and an etching resistance. CONSTITUTION: The photosensitive copolymer is represented by the formula 3, wherein R is a methyl or ethyl group; R* is H or a methyl group; and n is an integer of 22-26. The photosensitive terpolymer is represented by the formula 4 or 5, wherein R is a methyl or ethyl group; R* is H or a methyl group; R' is H, an alkyl group or a hydroxyalkyl group; R'' is H or a methyl group; and m+n=1, 0.1<m<0.9 and 0.1<n<0.9. The composition comprises 1-30 wt% of at least one polymer selected from the copolymer and the terpolymers; optionally 0.5-10 wt% of a photoacid generator; and optionally 0.01-2.00 wt% of an organic base.