发明名称 GAS SUPPLY APPARATUS FOR SEMICONDUCTOR FABRICATING EQUIPMENT
摘要 PURPOSE: A gas supply apparatus for semiconductor fabricating equipment is provided to prevent a shower head and a gas injecting pipe from being damaged or avoid particles when the shower head and the gas injecting pipe are interconnected by making a connection part come in contact with the gas injecting pipe such that the connection part is formed as one body with the shower head. CONSTITUTION: A chamber(106) is prepared. The shower head(102) supplies gas toward a semiconductor substrate in the chamber. The gas injecting pipe(108) supplies gas to the shower head from the outside of the chamber. The connection part(104) penetrates the wall of the chamber and is connected to the gas injecting pipe.
申请公布号 KR20040037458(A) 申请公布日期 2004.05.07
申请号 KR20020065945 申请日期 2002.10.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, HYEONG JUN
分类号 H01L21/205;(IPC1-7):H01L21/205 主分类号 H01L21/205
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