发明名称 |
Substrate holder for retaining a substrate within a processing chamber |
摘要 |
A wafer chuck is designed to allow the substrate to thermally deform during charged particle beam lithography. The wafer chuck includes a compliant layer disposed over an chuck body. During lithography processing the wafer is electrostatically held in contact with a flexible compliant layer and the wafer is exposed to the charged particle beam resulting in thermal deformation of the wafer. The compliant layer deforms with the substrate and allows the wafer to deform in a predictable manner.
|
申请公布号 |
US2004084633(A1) |
申请公布日期 |
2004.05.06 |
申请号 |
US20030705182 |
申请日期 |
2003.11.10 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
MOFFATT STEPHEN |
分类号 |
H01L21/683;H01L21/687;(IPC1-7):H01J37/20 |
主分类号 |
H01L21/683 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|