发明名称 DOUBLE AND TRIPLE GATE MOSFET DEVICES AND METHODS FOR MAKING SAME
摘要 A double gate metal-oxide semiconductor field-effect transistor (MOSFET) includes a fin (220), a first gate (240) and a second gate (420). The first gate (240) is formed on top of the fin (220). The second gate (420) surrounds the fin (220) and the first gate (240). In another implementation, a triple gate MOSFET includes a fin (220), a first gate (710), a second gate (720), and a third gate (730). The first gate (710) is formed on top of the fin (220). The second gate (720) is formed adjacent the fin (220). The third gate (730) is formed adjacent the fin (220) and opposite the second gate (720).
申请公布号 WO2004038808(A2) 申请公布日期 2004.05.06
申请号 WO2003US32660 申请日期 2003.10.14
申请人 ADVANCED MICRO DEVICES, INC. 发明人 LIN, MING-REN;AN, JUDY, XILIN;KRIVOKAPIC, ZORAN;TABERY, CYRUS, E.;WANG, HAIHONG;YU, BIN
分类号 H01L21/336;H01L29/423;H01L29/786 主分类号 H01L21/336
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