| 摘要 |
Array substrates that have protective layer that includes a metal oxide layer are resistant to the conditions to which the array substrates are exposed, e.g. during their manufacture and/or use. In an embodiments, the array substrates include a reflective layer comprising a metal layer, and the protective layer of metal oxide is typically supported on the metal layer. The metal oxide layer may, in particular embodiments, include the oxide of the metal used in the reflective layer. Chromium, aluminum, titanium, and tantalum are metals of choice for the metal layer, although other metals may be used. The protective layer typically includes oxides of chromium, aluminum, titanium, or tantalum. Methods of forming the substrate using sputtering, evaporation, chemical vapor deposition, or plasma-enhanced chemical vapor deposition are taught.
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