摘要 |
PURPOSE: An LCD device is provided to install a horizontal mobile-type particle remover on a load/unload lock chamber, in order to omit a washing process of transferring to a cleaning equipment after a PECVD(Plasma Enhanced Chemical Vapor Deposition) process, thereby reducing a TAT(Turn Around Time). CONSTITUTION: A load/unload lock chamber(30) comprises as follows. Substrate guides(31) are disposed in square edge portions of a substrate(32) in order to fix the substrate(32). A rising/falling stage(33) is located in an upper part of the load/unload lock chamber(30). A horizontal mobile-type particle remover(34) removes particles existing on a surface of the substrate(32) on a lower side of the rising/falling stage(33) of the load/unload lock chamber(30). The horizontal mobile-type particle remover(34) consists of a spray nozzle(34a) and an inhaling nozzle(34b). The spray nozzle(34a) sprays a high-voltage N2 gas to the substrate(32). The inhaling nozzle(34b) removes the particles by inhaling the particles. |