| 摘要 |
A method of fabricating a thin film transistor for liquid crystal display is provided. A polysilicon island and a gate insulating layer covered on the polysilicon island are formed on a substrate. A metal layer is formed on the gate insulating layer. A pair of trenches exposing predetermined regions of the polysilicon island are formed in the metal layer and the gate insulating layer. P-type impurities are doped into the uncovered polysilicon regions of the polysilicon island. A gate electrode is formed by removing parts of the metal layer and the gate insulating layer. N-type impurities are doped into the exposed portions of the polysilicon island. Thereby LDD regions, and a source and a drain regions are formed at the regions doped with both n-type and p-type impurities and at the regions doped with only n-type impurities respectively.
|
