METHOD FOR TAPER-ETCHING CHROME LAYER TO FORM TAPER STRUCTURE OF GATE ELECTRODE, SOURCE/DRAIN ELECTRODE, AND DATA LINE

摘要

PURPOSE: A taper-etching method for a chrome layer is provided to improve reliability and durability of an LCD device by using a taper-etching method for fabricating the LCD device. CONSTITUTION: A metal layer is deposited on a substrate. A surface of the metal layer is processed by an oxygen plasma method. A photoresist(22) is coated on the metal layer. The photoresist is covered with a mask. A patterning process is performed by the mask. The metal layer is etched to form a taper structure by using the photoresist as a mask. The metal layer is used as a conductive layer of an LCD device. The metal layer is formed with chrome or molybdenum.