发明名称 Exposure device, exposure system, recipe generation system, and device manufacturing method
摘要 A recipe generation system is a system for generating exposure device recipe data and includes upper node system linkage means for acquiring reticle design information data from an upper node system by online and recipe generation means for generating recipe data according to the reticle design information system.
申请公布号 AU2003277497(A8) 申请公布日期 2004.05.04
申请号 AU20030277497 申请日期 2003.10.08
申请人 NIKON SYSTEMS INC.;NIKON CORPORATION 发明人 HIROYUKI SUZUKI;MITSUHIRO NAKAI;AKIRA HIRAOKA
分类号 G03F1/00;G03F7/20 主分类号 G03F1/00
代理机构 代理人
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