Polymers, chemical amplification resist compositions and patterning process

摘要

Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel.R<1>, R<2 >and R<3 >are independently H, F, C1-20 alkyl or fluorinated C1-20 alkyl, at least one of R<1>, R<2 >and R<3 >contains fluorine, and R<4 >is an acid labile group. Using such polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.