发明名称 |
System and method for controlled polishing and planarization of semiconductor wafers |
摘要 |
A system and method for polishing semiconductor wafers includes a rotatable polishing pad movably positionable in a plurality of partially overlapping configurations with respect to a semiconductor wafer. A pad dressing assembly positioned coplanar, and adjacent, to the wafer provides in-situ pad conditioning to a portion of the polishing pad not in contact with the wafer. The method includes the step of radially moving the polishing pad with respect to the wafer.
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申请公布号 |
US6729943(B2) |
申请公布日期 |
2004.05.04 |
申请号 |
US20010025379 |
申请日期 |
2001.12.18 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
KISTLER ROD;GOTKIS YEHIEL |
分类号 |
B24B37/04;B24B41/06;B24B49/04;B24B51/00;B24B53/007;H01L21/304;(IPC1-7):B24B29/00;B24B5/00 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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